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AN119: Determination of an Anionic Fluorochemical Surfactant in a Semiconductor Etch Bath Be the first to rate this application

an119 determination an anionic fluorochemical surfactant a semiconductor etch bath

Description

This AN describes the techniques, instrumentation, and method for determining low mg/L (ppm) amounts of the fluorochemical surfactant FC-93 in an etch bath (1 part hydrofluoric acid/6 parts ammonium fluoride) by IC. The surfactant is removed from the HF matrix by passing the sample through an IonPac NG1 column. The IonPac NG1 is a polymeric, reversed-phase column that quantitatively retains the surfactant but does not retain inorganic anions. The concentrated surfactant is then eluted from the IonPac NG1 onto an OmniPac PAX-500 column set and detected by chemically-suppressed conductivity.
Market: Chemical
Keywords: Online sample preparation, FC-93, OmniPac PAX-500, Suppressed conductivity detection, IonPac NG1, fluorochemical
Matrix: Etch bath (1 part hydrofluoric acid/6 parts ammonium fluoride)
Author: Mark Laikhtman and Jeff Rohrer
Affiliation: Thermo Fisher Scientific
Uploaded on 5/11/2015.

For Research Use Only. Not for use in diagnostic procedures.