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AN139: Determination of Additives and Byproducts in an Acid Copper Plating Bath by Liquid Chromatography.
Description
Copper electroplating systems are used for the deposition of copper on semiconductor wafers. The primary components of an acid copper plating bath are copper sulfate, sulfuric acid, and hydrochloric acid. As the bath ages, certain byproducts are formed as a result of the plating process. Tracking the levels of these components ensures the quality of the fill. Chromatography can be used to quantitatively measure individual components. This Application Note describes the use of the IonPac NS1 column with absorbance detection to determine additives and byproducts in acid copper plating baths.| Market: | Material Science |
| Keywords: | accelerator, AD25 Absorbance Detector, Copper electroplating systems, GP50 Gradient Pump, IonPac NS1, leveler, plating bath suppressor |
| Matrix: | Copper Plating Bath |
| Author: | Mark Laikhtman and Jeff Rohrer |
| Affiliation: | Thermo Fisher Scientific |
For Research Use Only. Not for use in diagnostic procedures.
