AN131: Determination of Transition Metals at PPT Levels in High-Purity Water and SC2 (D-clean) Baths

Instrument Type: IC

Semiconductor cleaning solutions used to remove potentially damaging transition metal contamination are monitored to assess cleaning efficiency. Here trace concentrations (ng/L) of transition metals in semiconductor cleaning solutions and deionized water are separated using the strong complexing agent, pyridine-2,6-dicarboxylic acid (PDCA), on an IonPac CS5A column optimized with anion- and cation-exchange chemistry. Then a post-column derivitization agent, 4-(2- pyridilazo)resorcinol (PAR), is added to displace PDCA and to facilitate detection at 520–530 nm.

AN170: Determination of Silicate in High-Purity Water Using Ion Chromatography and Online Sample Preparation.

Instrument Type: IC

The water used in the manufacture of semiconductors and other electronic components must be extremely pure, referred to as ultra high-purity water (UHPW). The production of UHPW includes deionization to remove corrosive strong acid anions. Deionization cartridges exhaust their capacity over time. To ensure the early recognition of cartridge depletion, silicate must be detected at concentrations lower than 1 μg/L. These low detections limits can be achieved by pre concentrating UHPW on a Dionex IonPac AG4A-SC column, then separating the concentrated sample on a Dionex IonPac AS17 column set.