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Routine determination of ultratrace elements in semiconductor grade nitric acid by the Thermo Scientific iCAP RQ ICP-MS
Description
To determine ultratrace metal concentrations in semiconductor grade nitric acid (HNO3). To demonstrate the use of cold plasma (CP) and kinetic energy discrimination (KED) to reduce background equivalent concentrations (BEC) and improve detection limits (LoD). Demonstrate the use of the Thermo Scientific™ iCAP™ RQ ICP-MS to perform reproducible ultratrace ng·L⁻¹ (ppt) measurements of semiconductor relevant elements in nitric acid.Market: | Electronics & Semiconductors |
Keywords: | ICP-MS, Cold plasma, iCAP RQ, nitic acid, semiconductor analysis |
Matrix: | HNO3, Nitric Acid |
Author: | Tomoko Vincent[1], Jones Hsu [2], Vicki Wu [3], Julian Wills [1] |
Affiliation: | [1] Thermo Fisher Scientific, Bremen, Germany; [2] BASF, Taipei, Taiwan; [3] Joy Allied Technology, Taipei, Taiwan |
For Research Use Only. Not for use in diagnostic procedures.